HANDOUTS:

Thursday, Feb. 21, 2008

• Contact Photolithographic Alignment Tutorial
• Information on contact alignment procedures, useful for next week's gate lithography step.

Tuesday, Feb. 14, 2008

• Lithography and Other Patterning Techniques for Future Electronics
• R. Fabian Pease, Fellow IEEE, and Stephen Y. Chou, Fellow IEEE
• "As integrated circuits continue to go smaller, laying down circuit patterns on semiconductor material becomes more expensive and new techniques are needed."
• Proceedings of the IEEE | Vol. 96, No. 2, February 2008