This course addresses the issue of transferring novel IC technologies to production. Three main topics will be covered:
Experimental design techniques are used to optimize an IC fabrication process. We will discuss techniques ranging from simple comparison of treatments to complex multivariate response surface analysis.
The widespread application of statistical process control (SPC) in IC production was a major strategic goal for the 1990s. The goal for this decade is Advanced Process Control (APC). We will cover traditional SPC methods and we will detail their continuing evolution towards APC.
Integrated circuits and fabrication processes must be designed for optimum manufacturability. We will address this issue by discussing several Design for Manufacturability techniques and tools.
The course is self-contained for the student whose background includes IC processing (EE143) and design (EE140 or EE141).
Professor Costas J. Spanos Professor Kameshwar Poolla
Phone: 510 643 6776 Phone: 510 642 4642
Fax 642 2739 Fax 643 5599
Lecture Notes Homework Assignments  Study Guide
Some papers about Yield Statistical Tables Project Instructions
Roadmap for Semiconductors Class newsgroup Project Presentation Template
Semiconductor Manufacturing Textbook Project Report Format