EE 245 / NEEM 6441: Introduction to MEMS DesignFall 2007 |
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Announcements (updated 11/14):
Course Description:The course will begin with a summary of integrated circuit fabrication technologies leading into an overview of the technologies available to shape electromechanical elements on a submillimeter scale. Physics of MEMS devices will be covered at a level necessary to design and analyze new devices and systems. Several commercially available MEMS processes will be discussed in detail, and students will design final projects in these processes. Topical Areas Include: Basic fabrication techniques: lithography, thin film deposition, chemical and plasma etching, anisotropic silicon etching. Device physics: beam theory, electrostatic actuation, capacitive and piezoresistive sensing, thermal sensors and actuators. Standard processes: 2 layer polysilicon, CMOS, LIGA, Electronic interfacing, mechanical and electrical noise, fundamental limits CAD tools: layout, process simulation, PDE and ODE solvers, synthesis.Instructor:Prof. Kris PisterCourse Consultant:Sarah Bergbreitersbergbre@eecs.berkeley.edu Phone: (510) 642-5776 Fax: (510) 643-5877 Office Hours: Tuesday/Thursday 11am-noon (PST) Contact Information:For course content and prerequisites, contact the course consultant. For information regarding registration, pricing or other administrative items, contact the CalVIEW office: CALVIEW OFFICE205 McLaughlin Hall University of California, Berkeley Berkeley, CA 94720 Phone: (510) 642-5776 Fax: (510) 643-5877 Email: ntu@coe.berkeley.edu Web Page: www.coe.berkeley.edu/calview |